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Advanced Coatings for Large-Area or High-Volume Products

The International Conference on Coatings on Glass and Plastics

June 12-16, 2016 Conference Center Braunschweig Germany

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Poster Session

Tuesday, June 14
05:30 p.m. – 07:00 p.m.

The poster session will take place on Tuesday. The jury of the international organizing committee will award the best three posters. Additionally, the “Hans Pulker Award” will be given to the best paper of the whole conference.

Session 1 – Advanced Vacuum Processes

P1.01 – Coatings with a High Surface Roughness Prepared by a Co-sputtering Method Using Dual Rotatable Magnetrons
T. Preussner / M. Junghähnel / U. Hartung / T. Kopte
Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, Germany
P1.02 – Deposition of ITO Films by Reactive High Power Impulse Magnetron Sputtering from a Metallic Rotatable Target
F.C. Carreri1,2 / H. Gerdes1 / R. Bandorf1 / M. Vergöhl1 / G. Bräuer1
1Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany
2CAPES Foundation, Ministry of Education of Brazil, Brazil
P1.04 – Hyperspectral Imaging – a Versatile Tool for the 100%-inspection of Large Area Coated Substrates
W. Grählert / F. Gruber / P. Wollmann / S. Kaskel
Fraunhofer Institute for Material and Beam Technology IWS, Germany

Session 2 – Wet-chemical and Hybrid Processes

P2.01 – A Novel Primer Material Suitable for Connecting the Cyclic Olefin Polymer Film with an Electroconductive Layer
T. Yamate1,2 / E. Mieda1 / K. Kumazawa1 / H. Suzuki1 / M. Akazome2
1Nippon Soda Co. Ltd, Chiba Research Center, Japan
2Department of Applied Chemistry and Biotechnology, Graduate School of Engineering Chiba University, Japan
P2.02 – Material- and Energy-efficient Production of Ultra-transparent Conductive Films Based on Rodlike Conductive Nanoparticles
T. Ackermann / S. Sahakalkan / L. Boonen / C. Glanz / I. Kolaric
Fraunhofer Institute for Manufacturing Engineering and Automation IPA, Germany
P2.03 – Development Steps of an Automated Layer by Layer Spray Deposition System
P. Mundra, Southwall Europe GmbH, Germany
P2.04 – Investigation of CH₃NH₃PbI₃ Films Stability by Various Techniques: First Steps Towards Long-term Stability of Perovskite Solar Cells
R. Muydinov1 / D. Ziebell1 / P. Farin2 / C.A. Omondi3 / S. Khachadorian2 / S. Seeger1 / T. Dittrich3 / A. Hoffmann2 / B. Szyszka1
1Technical University Berlin, Institute of High Frequency and Semiconductor System Technologies, Germany
2Technical University Berlin, Institute of Solid State Physics, Germany
3Helmholtz Centre Berlin, Institute of Heterogeneous Materials Systems, Germany

Session 3 – ALD, CVD, and Atmospheric Plasma Processes

P3.01 – The Reel to Reel Application of Microsecond Pulsed Plasma for Enhanced Coating at Atmospheric Pressure
J.L. Hodgkinson / P.E. Sheel / H.M. Yates
University of Salford, Materials & Physics Research Centre, United Kingdom
P3.02 – Composite Materials, Nanolaminates and Nanoporous Thin Layers Made by ALD/MLD
L. Ghazaryan1 / E.B. Kley1 / A. Tünnermann1,2 / A. Szeghalmi1,2
1Friedrich Schiller University Jena, Institute of Applied Physics, Germany
2Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Germany
P3.03 – Control of Contamination and Radical Recombination in a Remote SDBD Plasma Source for Spatial ALD
M. Seitz / M. Mione / N. Debernardi / Y. Creyghton
TNO Solliance, Thin Film Technologies, The Netherlands
P3.04 – Spatial Structure Characterization of Surface Dielectric Barrier Discharge Plasma
N. Debernardi / M. Seitz / M. Mione / Y. Creyghton
TNO Solliance, Thin Film Technologies, The Netherlands

Session 4 – Processes for Flexible Substrates

P4.01 – Characterization of Stochastic Nanostructures on Ethylene Tetrafluoroethylene Films
C. Steiner / J. Fahlteich
Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, Germany
P4.02 – Reactive Sputtering Method for Achieving High Rates and Reduced Heat Load on Sensitive Polymer Film
H. Pröhl / C. Perplies, VON ARDENNE GmbH, Germany
P4.03 – Influence of Thin-film Properties on the Reliability of Flexible Glass
J. Westphalen1,2 / M. Junghähnel2 / S. Weller2 / G. Lorenz3 / F. Naumann3
1Technical University Ilmenau, Department of Inorganic-nonmetallic Materials, Germany
2Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, Germany
3Fraunhofer Institute for Microstructure of Materials and Systems IMWS Halle, Center for Applied Microstructure Diagnostics CAM, Germany
P4.04 – Processing of Thin-films on Ultra-thin Flexible Glass
M. Junghähnel / M. Fahland / C. May / S. Mogck
Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, Germany
P4.05 – OLED Lighting Using Ultra-thin Flexible Glass
S. Mogck1 / M. Stanel1 / Y. Hasegawa2 / K. Mitsugi2 / Y. Uno2
1Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP, Germany
2Nippon Electric Glass Co., Ltd., Japan

Session 5 – Film Growth, Process Control, and Model Based

P5.01 – Effects of Al Content on the Properties of ZnO:Al Films Prepared by Serial Co-sputtering Using a Dual Cylindrical Rotatable Magnetron Assembly
S. Körner1 / M. Hartig1 / R. Muydinov1 / D. Erfurt2 / B. Szyszka1,3
1Technical University Berlin, Germany
2PVcomB, Helmholtz-Zentrum Berlin für Materialien und Energie, Germany
3Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany
P5.02 – High-rate Deposition of Visible-light Active Thin-film WO₃ Photocatalyst
J. Jia / N. Oka / A. Murata / Y. Iwabuchi / H. Kotsubo / Y. Shigesato
Graduate school of science and engineering, Aoyama Gakuin University, Japan
P5.03 – Hybrid Organic-inorganic Silica Materials: A Simple Method to Modify the Nature of Glass Surface
B. Holubova / Z. Zlámalová Cílová / A. Helebrant
University of Chemistry and Technology, Czech Republic
P5.04 – Effects of Ion Bombardment Pretreatment on Glass Coating Processes and Post Tempering
J. M. Marco1 / R. Alonso2 / A. Cueva2 / F. Meyer3 / V. Bellido-Gonzalez3 / I. Sorzabal-Bellido3
1Ariño-Duglass, Spain
2Universy of Zaragoza, Spain
3Gencoa Ltd, United Kingdom
P5.05 – Flash Lamp Annealing for Low-cost Transparent Conducting Oxide Layers
L. Rebohle1 / A. Mathey1 / S. Prucnal1 / K. Wiesenhütter1 / L. Vines2 / P. Lindberg2 / B. Svensson2 / F. L. Bregolin1 / W. Skorupa1
1Helmholtz-Zentrum Dresden–Rossendorf, Institute of Ion Beam Physics and Materials Research, Germany
2University of Oslo, Department of Physics, Norway
P5.06 – Sub-second Thermal Processing with Flash Lamps: Equipment and Modelling Issues
T. Schumann / L. Rebohle / W. Skorupa
Helmholtz-Zentrum Dresden–Rossendorf, Institute of Ion Beam Physics and Materials Research, Germany
P5.07 – Sustainable Thin-Film Deposition Processing in Large Area / Large Volume Production Environments: Chances for Novel Thermal Processes
J. Meliksetyan / T. Gebel
Hochschule Mittweida – University of Applied Sciences, Germany
P5.08 – Non-contact Surface Resistance Tester for High-resistance Material from 109 to 1016 Ω
T. Sugimoto1 / K. Taguchi2 / M. Nakamura2
1Yamagata University, Graduate school of engineering and science, Japan
2Napson Corporation, Japan
P5.09 – From Color to Chemometrics: Strategies to Determine Coating Thickness and Quality
C. Hellwig / T. Büttner / M. Krause
Carl Zeiss Spectroscopy GmbH, Germany
P5.10 – Fluorescence XASF Analysis on Dopant Site in Ga, In Co-doped ZnO (GIZO) Thin Films and Their Polycrystalline Structure
K. Nagamoto / T. Hara
Research and Development Division, LINTEC Corporation, Japan
P5.11 – Using an Advanced Process Control System for the Control of the Reactive Al₂O₃ Sputter Process
V. Linss / J. Löhnert / H. Hagenström
P5.12 – Optical In-line Monitoring of Deposited Layers in Large Area Coating Lines
S. Uredat / T. Schenk / M. Klein / T. Zettler
LayTec in-line GmbH, Germany
P5.13 – Broadband Plasma Emission Monitoring: Technology and Application for Large Area Process Monitoring and Control
M. Audronis, Nova Fabrica Ltd., Lithuania

Session 6 – Energy Conversion, Saving, and Storage

P6.01 – Sensing Grain Boundaries in Polycrystalline ZnO Thin Films by Infrared Spectroscopy
P. Prunici / C. David / B. Tinkham / A. Panckow
Solayer GmbH, Germany
P6.02 – New Approach for Electrochromic Cells Using Atmospheric Pressure Deposition Techniques
D. Kloß / I. Zunke / A. Heft / J. Schmidt / B. Grünler
INNOVENT e. V., Surface Engineering, Germany
P6.03 – Tunable Weakly Negative Permittivity in Fe78Si13B9 Granular Composites at Radio-frequency Range
Y. Liu1 / P. Xie1 / K. Sun1 / Z. Wang1 / R. Fan1,2 / Z. Zhang1
1Key Laboratory for Liquid-solid Structural Evolution and Processing of Materials (Ministry of Education), China
2College of Ocean Science and Engineering, Shanghai Maritime University, China
P6.04 – Antimony Free Solar Glass
P. K. Kheruka / R. V. Pillai, Gujarat Borosil Limite, India

Session 7 – Optics, Consumer Electronics, and Communication

P7.01 – Wide Range UV Optical Mirror Composed of HfO₂ and SiO₂
K. Muro / S. Higano / H. Higuchi / K. Kon
ASAHI SPECTRA Co.,Ltd., Optical coating div., Japan
P7.02 – Magnetron Sputtered Indium Tin Oxides as Alternative of Noble Metals in the Near-infrared Region
H. Ye / X. Fang / X. Liu, Zhejiang University, Japan
P7.03 – Improvement of Heat Resistance of Anti-reflection Coatings on High Refractive Index Plastic Lens Substrates
T. Yoshida, Tokai Optical Co.,Ltd. / R&D Department, Japan
P7.04 – Scratch-resistant Anti-reflective Coatings for Consumer Electronic Applications
T. Damm / C. Henn / I. Burger / M. Kuhr / E. Rudigier-Voigt
SCHOTT AG, Germany
P7.05 – Advanced Technology for Automated Multiangle UV-Vis / NIR Reflectance, Transmittance and Absorptance Measurements
A. Kerstan / M. Schulz, Agilent Technologies, Germany
P7.06 – Optical Characterization of Thin Films Using a New Universal Measurement Accessory for UV-Vis / NIR Spectrophotometers
A. Kerstan / M. Schulz, Agilent Technologies, Germany

Session 8 – Medical, Food, and Environmental Applications

P8.01 – Plasma-induced Surface Polymerization of Unsaturated Functional Monomers via Locally Separated Plasma and Coating Zones
A. Herrmann / M. Franke / K. Nagel / M. Thomas / M. Eichler / K. Lachmann / C.-P. Klages
Fraunhofer Institute for Surface Engineering and Thin Films IST, Germany
P8.02 – Systematic Development of a Low-melting Lead-free Glass Decor
A. Deinhardt / M. Kilo / S. Senger / G. Schottner
Fraunhofer Institute for Silicate Research ISC, Germany

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2016-06-10 16:42:37 CEST
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